Tantalum
01
Kumukuai o na Papa Tanb3/ Tanb20/ Ta2.5w Na Kg Tantalum Papa No ka Sputtering Target
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- Tantalum pahu hopu, tantalum paipu, pepa, koʻokoʻo mea he uliuli-hina hoʻololi metala a he kiʻekiʻe hehee ai metala.Tantalum mea ductile, paakiki a me ka corrosion kū'ē, a tantalum e ole react me ka aqua regia.Hoʻohana 'ia i loko o ka hana kemika lako, vacuum paipu, lapaʻau lako a me implants.
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- Hoʻolālā ʻia ʻo Tantalum Sputtering Targets e hoʻokō i nā koi koi o ka semiconductor a me nā ʻoihana uila. Hana ʻia kā mākou mau pahuhopu sputtering me ka pololei a me ka ʻike e hōʻoia i ka hana ʻoi aku ka maikaʻi a me ka hilinaʻi i nā kaʻina hoʻoheheʻe kiʻiʻoniʻoni lahilahi.
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- ʻO ka Tantalum kahi metala kūpaʻa-corrosion maikaʻi loa me ka conductivity wela a me ka uila, e hana ana ia i mea kūpono no ka sputtering targets. Loaʻa kā mākou Tantalum Sputtering Targets i nā ʻano like ʻole a me nā nui e hoʻokō i nā ʻōnaehana sputtering like ʻole a me nā koi deposition. Inā makemake ʻoe i nā pahuhopu planar, rotary, a i ʻole ke ʻano maʻamau, hiki iā mākou ke hāʻawi i ka hopena kūpono no kāu noi kikoʻī.
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- Hoʻokumu ʻia kā mākou mau pahuhopu sputtering me ka hoʻohana ʻana i nā ʻenehana hana kiʻekiʻe, e hopena i ka maʻemaʻe kiʻekiʻe a me ka paʻa e hōʻoia i ka hoʻopaʻa ʻana i nā kiʻiʻoniʻoni like ʻole. ʻO nā waiwai waiwai kūikawā o Tantalum, i hui pū ʻia me kā mākou mau kaʻina hana kikoʻī, hiki i kā mākou mau pahuhopu ke hoʻopuka i ka hana sputtering maikaʻi loa, ka mānoanoa kiʻi ʻoniʻoni, a me ka liʻiliʻi o ka hoʻoneʻe ʻana, e alakaʻi ana i ka hoʻomaikaʻi ʻana i ka huahana a me ka maikaʻi o ke kumukūʻai.
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- Hoʻomaopopo mākou i ke kuleana koʻikoʻi o ka sputtering targets e pāʻani i nā kaʻina deposition kiʻiʻoniʻoni lahilahi, a ua kūpaʻa mākou i ka hāʻawi ʻana i nā huahana i kūpono i nā kūlana kiʻekiʻe o ka maikaʻi a me ka hana. Loaʻa kā mākou Tantalum Sputtering Targets i nā hana hoʻomalu maikaʻi e hōʻoiaʻiʻo i ko lākou hilinaʻi a paʻa, e hāʻawi ana i kā mākou mea kūʻai aku i ka hilinaʻi e pono ai lākou no kā lākou noi koʻikoʻi.
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- ʻO kā mākou Tantalum Sputtering Targets, hāʻawi pū mākou i nā koho maʻamau e hoʻokō i nā koi o ka mea kūʻai aku. Inā makemake ʻoe i kahi ʻano kūʻokoʻa, ka nui, a i ʻole ka pae maʻemaʻe, hiki i kā mākou hui loea ke hana pū me ʻoe e hoʻomohala i kahi hoʻonā i kūpono i kāu kikoʻī kikoʻī.
ʻO ka pahu hoʻoheheʻe tantalum he mea ia i hoʻohana ʻia i ke kaʻina o ka hoʻopaʻa ʻana i ka sputter, ʻo ia ke ʻano hana e waiho ai i nā kiʻiʻoniʻoni lahilahi o nā mea ma luna o kahi substrate. Hana ʻia nā pahuhopu sputtering Tantalum i ka tantalum maʻemaʻe kiʻekiʻe a hoʻohana ʻia i ka hana ʻana o nā mea uila, e like me nā semiconductors, nā hōʻike papa pālahalaha, a me nā cell solar.
I ke kaʻina hana sputtering, hoʻokuʻu ʻia nā ʻātoma tantalum mai ka ʻili i kuhi ʻia. A laila waiho kēia mau ʻātoma i hoʻokuʻu ʻia ma luna o kahi substrate, e hana ana i kahi kiʻiʻoniʻoni lahilahi. Ua koho ʻia nā pahu hoʻoheheʻe Tantalum no ko lākou helu heheʻe kiʻekiʻe, ke kūpaʻa ʻana o ka corrosion, a me ka conductivity maikaʻi loa, e hoʻolilo iā lākou i mea kūpono no ka hoʻohana ʻana i ke kaʻina sputtering.
Loaʻa nā pahuhopu sputtering Tantalum i nā ʻano like ʻole a me nā nui e hoʻokō i nā ʻōnaehana sputtering like ʻole a me nā koi deposition. He mea koʻikoʻi lākou i ka hana ʻana i nā mea uila kiʻekiʻe a hoʻohana ʻia i nā ʻoihana ākea.
I ke kaʻina hana sputtering, hoʻokuʻu ʻia nā ʻātoma tantalum mai ka ʻili i kuhi ʻia. A laila waiho kēia mau ʻātoma i hoʻokuʻu ʻia ma luna o kahi substrate, e hana ana i kahi kiʻiʻoniʻoni lahilahi. Ua koho ʻia nā pahu hoʻoheheʻe Tantalum no ko lākou helu heheʻe kiʻekiʻe, ke kūpaʻa ʻana o ka corrosion, a me ka conductivity maikaʻi loa, e hoʻolilo iā lākou i mea kūpono no ka hoʻohana ʻana i ke kaʻina sputtering.
Loaʻa nā pahuhopu sputtering Tantalum i nā ʻano like ʻole a me nā nui e hoʻokō i nā ʻōnaehana sputtering like ʻole a me nā koi deposition. He mea koʻikoʻi lākou i ka hana ʻana i nā mea uila kiʻekiʻe a hoʻohana ʻia i nā ʻoihana ākea.
Me kā mākou Tantalum Sputtering Targets, hiki iā ʻoe ke manaʻo i ka hana kūʻokoʻa, hilinaʻi, a me ke kūpaʻa, e hana ana iā lākou i koho kūpono no kāu mau pahuhopu hoʻopaʻa kiʻi ʻoniʻoni.
Tantalum target, Tantalum supttering target
| Kūlana | ASTM B 708-2001 |
| Anana | Φ(25-400)mm*(3-28)mm |
| Mea waiwai | RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W) |
| Ka nui o ka pahu hopu | Anawaena 25mm a hiki i 400mm x Manoanoa 3mm a hiki i 28mm |
| Ka nui pahu hopu | ʻO ka mānoanoa 1mm a hiki i 12.7mm x Laulā a hiki i 600mm x lōʻihi a hiki i 2000mm |
| Maemae | ≥99.95% a i ʻole 99.99% |
ʻĀpana ʻenehana
| Papa | 3N, 3N5, 4N, me Ta 99.99% |
| Hoʻohāhā hou | 95% min |
| Ka nui o ka palaoa | ASTM 4 a ʻoi aku paha |
| Hoʻopau ʻili | 16Rms max. A i ʻole Ra 0,4 (RMS64 a ʻoi aku paha) |
| Palahalaha | 0.1mm a i ʻole 0.15% ka nui |
| Hoʻomanawanui | +/-0.010" ma nā ana āpau |
Hoʻohui Kimia
| Kemika ppm | ||||||||||||
| Koho | Mea nui | ʻO nā haumia maxmium | ||||||||||
| Ke alo nei | Nb | ʻO Fe | A | In | IN | No ka mea | O | KA | C | H | N | |
| Ta1 | Koena | 300 | 40 | 30 | 20 | 40 | 40 | 20 | 150 | 40 | 15 | 20 |
| Ta2 | Koena | 800 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb3 | Koena | ＜35000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb20 | Koena | 170000- 230000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| Ta2.5W | Koena | 400 | 50 | 30 | 20 | 30000 | 60 | 20 | 150 | 50 | 15 | 60 |
| Ta10W | Koena | 400 | 50 | 30 | 20 | 110000 | 60 | 20 | 150 | 50 | 15 | 60 |
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