Kiʻekiʻe maʻemaʻe hafnium metala sputtering pahu hopu, Hafnium Target No Electronics

ʻO ka Hafnium Sputtering Target Properties

Hafnium Sputtering Target kiko'ī

Hafnium Sputtering Target Applications

1. Hoʻohana ʻia i nā kaʻina hana hoʻoheheʻe, e like me ka deposition semiconductor, deposition chemical vapor (CVD), a me ka waiho ʻana o ka mahu kino (PVD).
2. Hoʻohana ʻia no ka optics, me ka pale ʻaʻahu, nā uhi hoʻonaninani, a me nā hōʻike.
ʻO kā mākou mau pahuhopu hafnium sputtering kiʻekiʻe, ka hopena kūpono no ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi i ka semiconductor a me ka hana uila. Hoʻolālā ʻia kā mākou hafnium sputtering target e hoʻokō i nā koi koi o nā kaʻina sputtering hou, e hōʻoiaʻiʻo ana i ka hana koʻikoʻi a me ka hilinaʻi.

Loaʻa i kā mākou mau pahuhopu hafnium sputtering i nā ʻano nui a me nā hoʻonohonoho e kūpono i nā ʻōnaehana sputtering like ʻole, e hāʻawi ana i ka maʻalahi a me ka hoʻohālikelike ʻana me nā ʻano mea like ʻole. Inā ʻoe e hoʻohana i ka magnetron sputtering, ion beam sputtering a i ʻole nā ​​ʻenehana sputtering ʻē aʻe, hāʻawi kā mākou mau pahuhopu hafnium i ka waiho ʻana o nā kiʻiʻoniʻoni like ʻole, e kōkua ana i ka hana ʻana i nā mea uila kiʻekiʻe a me nā ʻāpana semiconductor.
Ma waho aʻe o nā pahuhopu hafnium sputtering maʻamau, hāʻawi mākou i nā koho hana maʻamau e hoʻokō i nā koi o nā mea kūʻai aku, me nā ʻano like ʻole, nā nui a me nā haku mele. Hoʻolaʻa ʻia kā mākou hui o ka poʻe loea i ka hāʻawi ʻana i nā hopena i hana ʻia e hoʻokō i kāu mau pono deposition kiʻiʻoniʻoni lahilahi.