Zirconium
01
Zr702 Zirconium Sputtering Target Zirconium Zr Astm B550 Zr 702 Zirconium Target Zr Palte
Zr702 Zirconium Sputtering Target - a cutting-edge solution for high-performance thin film deposition processes. This advanced sputtering target is designed to meet the demanding requirements of the semiconductor, display and optical coating industries, delivering exceptional purity, uniformity and durability.
Zr702 sputtering targets are made from high-purity zirconium and have excellent material properties, making them ideal for thin film deposition applications. The high purity of this sputtering target ensures minimal impurities in the deposited film, thereby improving film quality and performance. Its exceptional uniformity and density distribution further contributes to consistent and reliable film deposition, making it the first choice for critical manufacturing processes.-
- Zr702 sputtering targets are engineered to provide excellent sputtering performance, allowing precise control of film thickness and composition. Its excellent thermal conductivity and mechanical strength ensure efficient heat dissipation and extended target service life, making it a cost-effective solution for high-volume production environments.
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- The sputter targets are available in a variety of sizes and configurations to suit different sputtering systems and process requirements, providing flexibility and compatibility with a variety of deposition equipment. Whether sputtered zirconium films for optical coatings, barrier layers in semiconductor devices, or decorative coatings in consumer electronics, Zr702 sputter targets provide consistent and reliable performance in different applications.
Specification
|
Grade |
Zr01(zr-0); Zr-1; zr702(r60702) |
|
Purity |
Zr+hf≥99.6% |
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Standard |
GB/T21183-2007; ASTM b551-92 |
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Classification |
Circle target; Plate target ; Tube target |
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Application |
Electronic information, plane display, sputtering coating, workpiece surface coating |
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