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Tungsten Titanium Sputtering Target 99.99% WTi10wt% Sputtering Targets

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Tungsten Titanium Sputtering Target 99.99% WTi10wt% Sputtering Targets

Bango Alloy supply tungsten target, tungsten sputtering target in a wide range of grades and specifications .Your fast shipment requirement could be satisfied from our extensive tungsten stock.
A tungsten alloy target is a material used in various applications, such as in the production of X-ray tubes, electron beam evaporation, and physical vapor deposition. 

    • Tungsten Titanium Sputtering Target 99lmt
      • Tungsten alloy targets are known for their high density, high melting point, and excellent thermal and electrical conductivity, making them suitable for use in high-energy applications. These targets are often used in medical imaging, industrial inspection, and semiconductor manufacturing processes.
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    • Tungsten Titanium Sputtering Target 99fka
      • The composition of tungsten alloy targets can vary, but they typically consist of tungsten combined with other metals such as nickel, copper, or iron to enhance their properties for specific applications.
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    • Tungsten Titanium Sputtering Target 9964h
      • Our tungsten alloy targets, designed to meet the demanding requirements of the semiconductor and thin film coating industries. Our tungsten alloy targets are engineered to deliver exceptional performance and reliability, making them the ideal choice for sputtering and thin film deposition processes.
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    Our tungsten alloy targets, designed to meet the demanding requirements of the semiconductor and thin film coating industries. Our tungsten alloy targets are engineered to deliver exceptional performance and reliability, making them the ideal choice for sputtering and thin film deposition processes.

    Tungsten intorduction

    Appearance

    Silver white metal luster

    Purity

    W≥99.95%

    Density

    not less than 19.1g/cm3

    Supply state

    Surface polishing, CNC machine processing

    Quality standards

    GB/T 3875-2006 (tungsten plate)

    Application Field

    Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgy machinery, smelting equipment, petroleum, and other fields.

    Features

    For the tungsten target after spraying and sintering, the diameter of the average transparent texture is 100um or smaller, with oxygen content of 20ppm or less, and the deflection wrestling is about 500Mpa.Increasing production of unprocessed metal powder and increasing sintering capacity can keep the cost of tungsten target at a low price. After sintering, the tungsten target has a high density. And it has a high level of transparent frame which can not be reached by traditional pressing sintering methods. What’s more, it significantly improved the deflection wrestling,  which lead to a significant reduction of particulate matter.

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