Tantalum
01
Tanb3/ Tanb20/ Ta2.5w Plates Price By Kg Tantalum Board For Sputtering Target
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- Tantalum target,tantalum tube, sheet, rod is a blue-gray transition metal and is a high melting point metal.Tantalum is ductile, hard and corrosion resistant, and tantalum will not react with aqua regia.Used in manufacturing chemical equipment, vacuum tubes, medical appliances and implants.
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- Tantalum Sputtering Targets are designed to meet the demanding requirements of the semiconductor and electronics industries. Our sputtering targets are manufactured with precision and expertise to ensure superior performance and reliability in thin film deposition processes.
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- Tantalum is a highly corrosion-resistant metal with excellent thermal and electrical conductivity, making it an ideal material for sputtering targets. Our Tantalum Sputtering Targets are available in various shapes and sizes to accommodate different sputtering systems and deposition requirements. Whether you need planar, rotary, or custom-shaped targets, we can provide the perfect solution for your specific application.
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- Our sputtering targets are produced using advanced manufacturing techniques, resulting in high purity and density to ensure uniform and consistent film deposition. The exceptional material properties of Tantalum, combined with our precise manufacturing processes, enable our targets to deliver excellent sputtering performance, uniform film thickness, and minimal target erosion, ultimately leading to improved productivity and cost efficiency.
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- We understand the critical role that sputtering targets play in thin film deposition processes, and we are committed to delivering products that meet the highest standards of quality and performance. Our Tantalum Sputtering Targets undergo rigorous quality control measures to guarantee their reliability and consistency, giving our customers the confidence they need for their critical applications.
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- Our Tantalum Sputtering Targets, we also offer customization options to meet specific customer requirements. Whether you need a unique shape, size, or purity level, our team of experts can work with you to develop a tailored solution that meets your exact specifications.
A tantalum sputtering target is a material used in the process of sputter deposition, which is a technique used to deposit thin films of material onto a substrate. Tantalum sputtering targets are made of high-purity tantalum and are used in the production of electronic devices, such as semiconductors, flat panel displays, and solar cells.
During the sputtering process, a high-energy plasma bombards the tantalum sputtering target, causing tantalum atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, forming a thin film. Tantalum sputtering targets are chosen for their high melting point, corrosion resistance, and excellent conductivity, making them ideal for use in the sputtering process.
Tantalum sputtering targets are available in various shapes and sizes to accommodate different sputtering systems and deposition requirements. They are a critical component in the production of advanced electronic devices and are used in a wide range of industries.
During the sputtering process, a high-energy plasma bombards the tantalum sputtering target, causing tantalum atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, forming a thin film. Tantalum sputtering targets are chosen for their high melting point, corrosion resistance, and excellent conductivity, making them ideal for use in the sputtering process.
Tantalum sputtering targets are available in various shapes and sizes to accommodate different sputtering systems and deposition requirements. They are a critical component in the production of advanced electronic devices and are used in a wide range of industries.
With our Tantalum Sputtering Targets, you can expect exceptional performance, reliability, and consistency, making them the ideal choice for your thin film deposition goals
Tantalum target, Tantalum supttering target
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Standard |
ASTM B 708-2001 |
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Dimension |
Φ(25-400)mm*(3-28)mm |
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Material |
RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W) |
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Circular target size |
Diameter 25mm up to 400mm x Thickness 3mm up to 28mm |
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Retangular target size |
Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm |
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Purity |
≥99.95% or 99.99% |
Technology Parameter
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Grade |
3N, 3N5, 4N, with Ta 99.99% |
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Recrystalization |
95% min |
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Grain size |
ASTM 4 or finer |
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Surface finish |
16Rms max. Or Ra 0,4(RMS64 or better) |
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Flatness |
0.1mm or 0.15% max |
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Tolerance |
+/-0.010" on all dimensions |
Chemical Composition
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Chemistry ppm |
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Designation |
Chief component |
Impurities maxmium |
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Ta |
Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
O |
C |
H |
N |
|
|
Ta1 |
Remainder |
300 |
40 |
30 |
20 |
40 |
40 |
20 |
150 |
40 |
15 |
20 |
|
Ta2 |
Remainder |
800 |
100 |
100 |
50 |
200 |
200 |
50 |
200 |
100 |
15 |
100 |
|
TaNb3 |
Remainder |
＜35000 |
100 |
100 |
50 |
200 |
200 |
50 |
200 |
100 |
15 |
100 |
|
TaNb20 |
Remainder |
170000- 230000 |
100 |
100 |
50 |
200 |
200 |
50 |
200 |
100 |
15 |
100 |
|
Ta2.5W |
Remainder |
400 |
50 |
30 |
20 |
30000 |
60 |
20 |
150 |
50 |
15 |
60 |
|
Ta10W |
Remainder |
400 |
50 |
30 |
20 |
110000 |
60 |
20 |
150 |
50 |
15 |
60 |
GET FINANCING!
Other products can be provided based on customer’s requirements