Molybdenum Target, Moly high thermal conductivity molybdenum sheet, Molybdenum plate, molybdenum PLATE, Molybdenum disc

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element

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  • The Molybdenum Target is manufactured using high-purity molybdenum, ensuring exceptional performance and reliability. Its superior thermal and electrical conductivity make it an ideal choice for sputtering applications, where precise deposition of thin films is crucial. With a focus on quality and precision, our Molybdenum Target is engineered to deliver consistent and uniform film deposition, resulting in enhanced product performance and yield.

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  • Its exceptional resistance to high temperatures and corrosive environments makes it a durable and long-lasting solution for a wide range of applications.The Molybdenum Target represents a significant advancement in materials technology, offering unparalleled performance, reliability, and versatility.

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  • Whether you are in the semiconductor, solar, or thin film coating industry, our Molybdenum Target is the solution you can rely on for your sputtering needs. Experience the difference with our innovative Molybdenum Target and elevate your manufacturing processes to new heights.

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