Niobium
01
HSG Niobium Target Disc Plate Wholesale Niobium Sputtering Target
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- Niobium sputtering target, designed to meet the demands of advanced thin film deposition processes. Our sputtering target is manufactured using pure niobium material, ensuring exceptional performance and reliability for a wide range of applications.
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- With a focus on precision and consistency, our niobium sputtering target is engineered to deliver uniform and controlled deposition, resulting in superior film quality and enhanced productivity. Whether you are working in semiconductor manufacturing, optical coatings, or research and development, our sputtering target is an ideal choice for achieving precise thin film deposition.
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- The exceptional purity and density of our niobium sputtering target make it an excellent choice for sputtering processes, enabling efficient material utilization and minimizing target consumption. This not only leads to cost savings but also contributes to a more sustainable and environmentally friendly production process.
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- Our niobium sputtering target is available in various sizes and configurations to accommodate different sputtering systems and deposition requirements. We understand the importance of customization and flexibility in meeting the unique needs of our customers, and our sputtering targets are designed to provide the versatility and performance required for diverse applications.
Niobium sputtering targets are commonly used in the production of thin films for various applications, including in the semiconductor industry, for optical coatings, and in the production of electronic devices. The high purity and uniformity of the niobium sputtering target are important for achieving high-quality thin films with desired properties.
These targets are typically made from high-purity niobium and are designed to withstand the sputtering process, ensuring efficient and consistent deposition of the niobium thin film onto the substrate.
These targets are typically made from high-purity niobium and are designed to withstand the sputtering process, ensuring efficient and consistent deposition of the niobium thin film onto the substrate.
Chemical Composition
|
Grade |
Nb1 |
Nb2 |
|
|
Main components |
Nb |
||
|
Fe |
0.004 |
0.01 |
|
|
Other impurities |
Si |
0.004 |
0.01 |
|
Ni |
0.002 |
0.005 |
|
|
W |
0.005 |
0.02 |
|
|
Mo |
0.005 |
0.01 |
|
|
Ti |
0.002 |
0.004 |
|
|
Ta |
0.07 |
0.1 |
|
|
O |
0.015 |
0.02 |
|
|
C |
0.004 |
0.01 |
|
|
H |
0.0015 |
0.0015 |
|
|
N |
0.003 |
0.008 |
Application field： chemical industry, medical industry, glasses, electricity, electroplating, electronics, aerospace, military industry, petroleum and other industries
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