Hafnium
High purity hafnium metal sputtering target, Hafnium Target For Electronics
Hafnium thin film coating can also be used to provide surface hardness and protection. AEM produces Hafnium sputtering targets with the highest quality refined crystal bars ensuring high purity, low zirconium content, and high reliability.
Hafnium Sputtering Target Properties
|
Chemical Formula |
Hf |
|
Atomic Weight |
178.49 |
|
Color/ Appearance |
Gray steel, metallic |
|
Melting Point |
2227℃ |
|
Thermal Conductivity |
23 W/m.K |
|
Coefficient of Thermal Expansion |
5.9 x 10-6/K |
|
Theoretical Density (g/cc) |
13.31 |
|
Z Ration |
0.36 |
|
Sputter |
DC |
|
Max Powder Density (Watts/Square Inch) |
50 |
|
Type of Bond |
Indium, elastomer |
Hafnium Sputtering Target Specifications
|
Description |
Hafnium Sputtering Targets |
|
|
Typical Purity |
Hf + Zr>99.99%, |
Zr<0.2%, 0.3%&0.5% |
|
Size |
Circular: Diameter < 14inch, Thickness > 1mm; |
Block: Length < 32inch, Width < 12inch, Thickness > 1mm |
|
Shape |
Disc, plate |
Column, step, custom-made |
Hafnium Sputtering Target Applications
1. Used in deposition processes, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
2. Used for optics, including wear protection, decorative coatings, and displays.
our high-quality hafnium sputtering targets, the ideal solution for thin film deposition in semiconductor and electronics manufacturing. Our hafnium sputtering targets are designed to meet the demanding requirements of modern sputtering processes, ensuring outstanding performance and reliability.
Our hafnium sputtering targets are available in a variety of sizes and configurations to fit different sputtering systems, providing flexibility and compatibility with a variety of equipment. Whether you use magnetron sputtering, ion beam sputtering or other sputtering techniques, our hafnium targets provide consistent and uniform film deposition, helping to produce high-performance electronic devices and semiconductor components.
In addition to standard hafnium sputtering targets, we offer custom manufacturing options to meet specific customer requirements, including unique shapes, sizes and compositions. Our team of experts is dedicated to providing tailor-made solutions to meet your specific thin film deposition needs.
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