Tantalum
01
High Purity 99.95% Tantalum Sheets Pellets Granules Grains
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- The Tantalum Pellet is a small, cylindrical-shaped component that is made from high-quality tantalum metal. It is specifically engineered to provide excellent capacitance and stability, making it ideal for use in a wide range of electronic applications. Whether it’s in consumer electronics, telecommunications, automotive systems, or industrial equipment, the Tantalum Pellet delivers exceptional performance and durability.
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- One of the key features of the Tantalum Pellet is its high energy density, which allows it to store a large amount of electrical charge in a small volume. This makes it perfect for applications where space is limited, without compromising on performance. Additionally, the Tantalum Pellet offers low leakage current and excellent temperature stability, ensuring consistent and reliable operation even in challenging environmental conditions.
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- Furthermore, the Tantalum Pellet is designed to meet the highest industry standards for quality and reliability. It undergoes rigorous testing and quality control measures to ensure that it meets the demanding requirements of modern electronic devices. This means that you can trust the Tantalum Pellet to deliver consistent and long-lasting performance in your electronic designs.
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- In conclusion, the Tantalum Pellet is a versatile and dependable electronic component that offers high capacitance, energy density, and reliability. Whether you are designing a new electronic product or looking to upgrade an existing one, the Tantalum Pellet is the perfect choice for ensuring optimal performance and longevity. Experience the difference that the Tantalum Pellet can make in your electronic designs.
A tantalum sputtering target is a material used in the process of sputter deposition, which is a technique used to deposit thin films of material onto a substrate. Tantalum sputtering targets are made of high-purity tantalum and are used in the production of electronic devices, such as semiconductors, flat panel displays, and solar cells.
During the sputtering process, a high-energy plasma bombards the tantalum sputtering target, causing tantalum atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, forming a thin film. Tantalum sputtering targets are designed to provide a consistent and uniform deposition of tantalum onto the substrate, ensuring high-quality thin film production.
The high purity of tantalum sputtering targets is crucial for achieving the desired film properties and performance in electronic devices. The use of tantalum sputtering targets allows for precise control over the thickness, composition, and structure of the deposited thin films, making them essential in the manufacturing of advanced electronic components.
During the sputtering process, a high-energy plasma bombards the tantalum sputtering target, causing tantalum atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, forming a thin film. Tantalum sputtering targets are designed to provide a consistent and uniform deposition of tantalum onto the substrate, ensuring high-quality thin film production.
The high purity of tantalum sputtering targets is crucial for achieving the desired film properties and performance in electronic devices. The use of tantalum sputtering targets allows for precise control over the thickness, composition, and structure of the deposited thin films, making them essential in the manufacturing of advanced electronic components.
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Grade |
R05200,R05400, Ta1, Ta10W, Ta2.5W |
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Purity |
≥99.95% |
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Density |
≥16.6g/cm3 |
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Melting point |
3410℃ |
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Delivery state |
Finished |
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Procedure |
Material-forging-rolling-cutting- tantalum pellets |
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Application |
Additives, processing parts |
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